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BASF and Entegris issued a joint press release announcing the sale of the Precision Microchemicals Business to Entegris. The transaction was completed on November 30, 2021. Learn more.

For sales inquiries, technical support, or to place an order,
please contact Entegris.

Polishing Pads, Precision

Chemetall Precision Microchemicals offer a wide range of ChemePol P polishing pads for use with MicroLap E series polishing and Microcut CMP Chemo-Mecahnical Planarizing suspensions. The correct choice of suspension and pad is critical for optimizing removal rate, surface finish, minimizing defectivity and sub-surface damage in the substrate or component. ChemePol P polishing pads are designed with the physical and chemical characteristics of the polishing suspension and substrate material in mind. The polishing or CMP environment is a dynamic interaction of abrasive, chemical and physical actors and a careful orchestration of these is vital for the correct results.

ChemePol P pads and MicroLap E Series Polishing and Microcut CMP Chemo-Mecahnical Planarizing suspensions are engineered to work together in the surface conditioning and finishing of metals, ceramics, glasses and crystalline materials.

Polishing & CMP Engineers, R&D and Production Staff are encouraged to contact Chemetall Precision Microchemicals for detailed information on pad and abrasive suspension selection for their specific applications.

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Safety Data Sheets (SDS)

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